for the first time in the country, a cluster type, multi-chamber Plasma–Enhanced Chemical Vapour Deposition (PECVD) system which can be used to coat different types of thin films on substrates.
R Giridhara Gopalan, vice president, HHV says, “This tool is highly versatile and provides maximum flexibility to the user by combining multiple processes without having the need to break the vacuum. Each chamber can be configured for a particular process like, PECVD, PVD, Etching etc thereby enabling researchers to carry out multiple experiments simultaneously. This equipment can be used for R&D in MEMS/NEMS, Solid State Lighting, Renewable Energy, Nano Electronics, and Photonics. It can also be integrated to a glove box unit for OLED applications. In addition HHV also offers certain standard process recipes along with the equipment.”
The cluster PECVD has all the necessary attributes needed for a world class research tool. It is a table top system, compact in size (occupies an area of just 3 metres by 3 metres), simple to operate, easy to maintain, reliable in performance, with precise control of parameters, fully programmable with all safety features incorporated in the same. It can handle substrates of various sizes starting from 100 mm.
